THE S.F.S.U. THIN FILM LABORATORY
|· Sputtering||· E-Beam evaporation|
|· Optical lithography||· Wet etching|
|· Plasma etching||· Solid-source doping|
|· S E M|
Because the major emphasis of research in this facility is the fabrication of super conducting devices, we are able to use materials which are banned in most laboratories dedicated to semi conducting devices.
In addition, we can process conventional wafers and substrates of nonstandard shape and thickness.